ALD (Atomic Layer Deposition) for Glove Boxes

ALD (Atomic Layer Deposition)

 

Purpose:

  • Atomic Layer Deposition Process.
  • ALD is slower than other CVD (Chemical Vapor Deposition) techniques, but the process provides better structural quality.

Technical Specifications

Technical specifications of the ALD (Atomic Layer Deposition) equipment:

External frame with integration / interface thanks to a flange.
Possible integration in the floor or on the back of the glove box.

Compatibility

 

This equipment can be installed on the following glove box models

Modular glove box with autonomous purification unit <1PPM H2O – O2

Compact purified glove box <1PPM H2O – O2 for research and industry

Modular glove box in gas scavenging. Easy to use, low maintenance.

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